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Martensite structures and twinning in substrate-constrained epitaxial Ni-Mn-Ga films deposited by a magnetron co-sputtering process

机译：通过磁控共溅射工艺沉积的基板约束外延Ni-mn-Ga薄膜中的马氏体结构和孪晶

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International audience

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Tillier, Jérémy; Bourgault, Daniel; Pairis, Sébastien; Ortega, Luc; Caillault, Nathalie; Carbone, Laurent;
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1. Stress induced martensite in epitaxial Ni-Mn-Ga films deposited on MgO(001) [J] . M. Thomas, O. Heczko, J. Buschbeck, Applied Physicsletters . 2008,第19期

机译：在MgO（001）上沉积的外延Ni-Mn-Ga薄膜中的应力诱导马氏体
2. X-ray absorption study of the local structure of Mg in hydroxyapatites thin films deposited by RF magnetron Co-Sputtering [J] . Bootchanont Atipong, Wechprasit Tirapat, Horprathum Mati, Radiation Physics and Chemistry . 2020,第1期

机译：X射线吸收研究Mg羟基磷灰石中磷酸盐薄膜的薄膜晶溅射
3. Influence of post-annealing atmosphere on microstructure, optical and electrical properties of zinc cadmium oxide films deposited by DC and RF magnetron co-sputtering [J] . Sui Y. R., Song Y. P., Wu Y. J., CERAMICS INTERNATIONAL . 2016,第14期

机译：后退火气氛对直流和射频磁控共溅射沉积氧化锌镉薄膜的微观结构，光电性能的影响
4. Structure and Morphology Study of Very Thin TiCrN Films Deposited by Unbalanced Magnetron Co-sputtering [C] . Chutima Paksunchai, Chirawat Chantharangsi, Somyod Denchitcharoen International Conference on Materials Science and Technology . 2019

机译：不平衡磁控杂交沉积的非常薄的TiCrn薄膜的结构和形态学研究
5. Evaluation of structure and material properties of RF magnetron sputter-deposited yttria-stabilized zirconia thin films. [D] . Piascik, Jeffrey Robert. 2007

机译：射频磁控溅射沉积的氧化钇稳定的氧化锆薄膜的结构和材料性能评估。
6. Thin films of binary amorphous Zn-Zr alloys developed by magnetron co-sputtering for the production of degradable coronary stents: A preliminary study [O] . Nathalie Annonay, Fatiha Challali, Marie-Noëlle Labour, 2018

机译：磁控共溅射制备可降解冠状动脉支架的二元非晶态Zn-Zr合金薄膜的初步研究
7. Martensite structures and twinning in substrate-constrained epitaxial Ni-Mn-Ga films deposited by a magnetron co-sputtering process [O] . Tillier, Jérémy, Bourgault, Daniel, Pairis, Sébastien, 2011

机译：马氏体结构和衬底约束外延中的孪晶通过磁控共溅射工艺沉积的Ni-mn-Ga膜

Martensite structures and twinning in substrate-constrained epitaxial Ni-Mn-Ga films deposited by a magnetron co-sputtering process

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